Plasma processing with energy supplied
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United States of America Patent
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Feb 19, 2002
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N/A
app pub date -
Jul 22, 1999
filing date -
Jul 23, 1998
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Abstract
In a plasma processing method, a plasma is generated using a process gas, and an electron beam is injected into the plasma to control an electron energy distribution in the plasma. Then, a semiconductor substrate is processed using the plasma with controlled electron energy distribution.
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