Substrate treating apparatus and substrate treating method

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United States of America Patent

PATENT NO 6352083
SERIAL NO

09195190

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A control unit controls a lifter to raise at least part of each of a group of substrates above the liquid level of a treating liquid in a treating bath. Thereafter, a valve is opened to drain the treating liquid from the treating bath at a high speed. As a result, a physical force to tilt and adhere an upper portion of the adjacent substrates accompanied by lowering of the liquid level of the treating liquid due to the high speed drainage acts upon a lower portion of the substrates near the lowered liquid level of the treating liquid, thereby reducing the physical force exerted on the substrates. This arrangement, even if a holding interval between the substrates is narrowed at a half of a normal pitch, eliminates a contact of the adjacent substrates and prevents damage of the substrates due to the contact without providing an additional member such as a substrate support guide in the treating bath.

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Patent Owner(s)

Patent OwnerAddress
SCREEN HOLDINGS CO LTDKYOTO JAPAN KYOTO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arai, Kenichiro Shiga-ken, JP 47 290
Araki, Hiroyuki Shiga-ken, JP 73 869
Yabuta, Masaaki Shiga-ken, JP 2 22

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