Extreme-UV scanning wafer and reticle stages

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United States of America Patent

PATENT NO 6353271
SERIAL NO

09430858

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Abstract

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A stage for precise positioning of a chuck in three orthogonal linear axes and in three orthogonal rotation axes that includes first and second subassemblies. The a first subassembly includes (i) a monolithic mirror that supports the chuck wherein the monolithic mirror has at least two polished orthogonal faces for interferometric determination of the X, Y, and .THETA.z positions; (ii) a plurality of electromagnetic actuators that control fine positioning in all six axes and coarse positioning in one axis; (iii) a position sensor for measuring the vertical Z position of the monolithic mirror; and (iv) a Lorentz actuator, that includes magnet array, for effecting motion in the Y axis. The a second subassembly comprising a stepping axis beam over which the first subassembly is suspended, wherein the stepping axis beam includes a drive coil array for the Lorentz actuator. T the stage can also include a cable stage subassembly that is positioned a fixed distance away from the monolithic mirror and/or a mechanical zero reference for the first subassembly.

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Patent Owner(s)

Patent OwnerAddress
EUV LLC2200 MISSION COLLEGE BLVD MS SCI-02 SANTA CLARA CA 95052-8119

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Williams, Mark E Windham, NH 81 1059

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