Substrate drying apparatus and substrate processing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Mar 12, 2002
Issued Date -
N/A
app pub date -
Mar 9, 2000
filing date -
Sep 10, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A deionized water temperature control part cools deionized water which is supplied from a deionized water supply source into a processing bath through a pipe after completely cleaning a substrate in the processing bath for maintaining the deionized water at a constant temperature which is lower than the ordinary temperature. A supply port of an IPA.N.sub.2 supply part provided in a casing of a multi-functional processing part is directed upward, thereby supplying IPA vapor upward with carrier gas of N.sub.2 for forming an atmosphere containing IPA vapor in high concentration above the processing bath. Thus, the substrate cooled to a low temperature is dried in the atmosphere containing the IPA vapor of the ordinary temperature in the upper portion of the processing bath when pulled up from the processing bath. Thus, the amount of the IPA vapor dissolved in the deionized water stored in the processing bath may be small, whereby consumption of the IPA vapor as well as generation of particles can be suppressed.
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