Method to form narrow structure using double-damascene process
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United States of America Patent
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Mar 12, 2002
Grant Date -
N/A
app pub date -
Oct 26, 1999
filing date -
Aug 11, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A narrow groove is formed over a substrate. To form such a narrow groove, a first material is formed over a substrate, the first material having a sidewall. A spacer is formed abutting the sidewall. Subsequently a second material is formed adjacent to the spacer. The spacer is removed leaving a groove between the first material and second material. In one embodiment, the groove is filled with material for a narrow feature, such as a gate, and the first material and second material are removed. As a result a gate or other narrow feature is formed having a length defined by the width of a spacer. In another embodiment, an implant is performed through the small groove, resulting in a small localized implant.
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