Solution processing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Apr 2, 2002
Grant Date -
N/A
app pub date -
Oct 23, 2000
filing date -
Oct 25, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Discharge ports of a supply nozzle are structured to be able to discharge a processing solution in a horizontal direction, and a guide plate for reducing the discharge pressure of the processing solution and guiding the processing solution to an under substrate is provided at a position facing the discharge ports. Thus, the appearance of micro bubbles at the time of the supply of the processing solution to the surface of the substrate can be inhibited, thereby reducing poor developing.
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