Porous ceramic liner for a plasma source
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United States of America Patent
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Apr 9, 2002
Grant Date -
N/A
app pub date -
Feb 17, 2000
filing date -
Feb 17, 2000
priority date (Note) -
Expired
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Abstract
A plasma tube comprising a vacuum sealing ceramic outer tube, a porous ceramic insert disposed on the inside wall of the outer tube, and a source of high frequency radiation, for example, an RF coil wrapped around the tube, to excite gas flowing through the bore of the insert into a plasma. The invention is particularly useful as an exhaust scrubber for oxidizing exhaust gases from a semiconductor processing chamber. A catalyst may be embedded in the porous insert to promote the scrubbing reaction. The invention may also be used in an applicator of a remote plasma source.
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