Method and apparatus for batch processed capacitors using masking techniques
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 9, 2002
Grant Date -
N/A
app pub date -
Sep 1, 1999
filing date -
Sep 1, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Batch thin film capacitors and their methods of manufacture using semiconductor manufacturing techniques. A mask, photo mask or shadow mask, having a pattern is used to form a matrix of rows and columns of thin film capacitors in a wafer. Capacitor terminals are formed in a batch process by separation at column saw areas, depositing a conductive layer and vertically etching horizontal layers of the conductive layer. Capacitance of an individual batch processed thin film capacitor is increased by stacking wafers together prior to separation at the column saw areas and forming capacitor terminals thereafter to couple parallel thin film capacitors together.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully