Support frame for substrates

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United States of America Patent

PATENT NO 6371712
SERIAL NO

09693613

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Abstract

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The present invention generally provides a system and method for supporting a substrate having a support frame that minimizes deflection encountered during thermal expansion in a processing chamber. In one embodiment, the support frame comprises one or more longitudinal members coupled to one or more transverse members. The transverse members preferably define a supporting surface on which a heated susceptor is mounted. The longitudinal member is preferably disposed below the heated susceptor, thus minimizing thermal expansion of the longitudinal member. Spacers made of thermally conductive material may be disposed at appropriate locations along the members to provide more uniform distribution of heat within the members.

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Patent Owner(s)

Patent OwnerAddress
APPLIED KOMATSU TECHNOLOGY INCTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Beer, Emanuel San Jose, CA 33 1380
Chang, Larry Los Altos, CA 7 88
White, John M Hayward, CA 381 24721

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