High target utilization magnet array and associated methods
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Apr 16, 2002
Grant Date -
N/A
app pub date -
Sep 28, 2000
filing date -
Sep 28, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An arrangement of magnets and stacks of magnets has been developed for use in magnetron sputtering devices. The arrangement may include commercially available or easily manufactured magnets. The arrangement may also include magnetic shunts to tune the magnetic field. The arrangements may be potted to provide protection from the environment, and may be incorporated into a system for cooling the magnets and target. When used in a magnetron sputtering device, the arrangement provides a magnetic field that results in nearly uniform sputtering over most of the target area. Further, the magnet arrangement provides target utilization values that are significantly higher than those provided by prior art magnet systems. Thus, the present invention also provides a method of arranging magnets for optimal performance and a method for improving target utilization.
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