Method for varying nitride strip makeup process based on field oxide loss and defect count
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United States of America Patent
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Apr 23, 2002
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N/A
app pub date -
Jan 3, 2000
filing date -
Jan 3, 2000
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Abstract
A method is provided for manufacturing, the method including processing a first workpiece in a nitride processing step and measuring a thickness of a field oxide feature formed on the first workpiece. The method also includes forming an output signal corresponding to the thickness of the field oxide feature. In addition, the method includes feeding back a control signal based on the output signal to adjust processing performed on a second workpiece in the nitride processing step to adjust a thickness of a field oxide feature formed on the second workpiece toward at least a predetermined threshold value.
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