Ultraviolet ray-transparent optical glass material and method of producing same
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United States of America Patent
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Apr 23, 2002
Grant Date -
N/A
app pub date -
Sep 1, 1999
filing date -
Sep 7, 1998
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Abstract
A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F.sub.2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50.degree. C. or less and a transmittance of 157 nm ultraviolet rays through a 10 mm optical path of 60% or more, and optically a OH group content of 1 to 70 ppm, a Cl content less than 1 ppm, a total content of impurity metals of 50 ppb or less, a content of each individual impurity metal less than 10 ppb, and an ultraviolet ray-transmittance at 172 to 200 nm of 40% or more even after the glass is exposed to an irradiation of ultraviolet rays at 160 to 300 nm for one hour.
First Claim
Family
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
- TOSOH CORPORATION;NIPPON SILICA GLASS CO., LTD.;YAMAGUCHI NIPPON SILICA GLASS CO., LTD.
International Classification(s)
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- [Patents Count]
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Fukuda, Kazuhiko | Shinnanyo, JP | 7 | 71 |
Ihara, Yoshinao | Shinnanyo, JP | 1 | 7 |
Kamisugi, Naoyoshi | Tokuyama, JP | 1 | 7 |
Kondo, Shinichi | Tokuyama, JP | 164 | 1055 |
Kuzuu, Nobu | Fukui, JP | 1 | 7 |
Nakamura, Takayuki | Tokuyama, JP | 187 | 1473 |
Wakamatsu, Hidetoshi | Yamaguchi-ken, JP | 26 | 206 |
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Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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