Substrate processing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Apr 30, 2002
Grant Date -
N/A
app pub date -
Sep 12, 2000
filing date -
Sep 12, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A first processing unit group for performing processing for a substrate at a temperature close to room temperature and a second processing unit group for performing heat processing for the substrate are disposed in divided different areas. Between the first processing unit group and the second processing unit group, the substrate is transferred only by means of a main transport apparatus and not directly. Thereby, temperature control can be precisely performed in the first processing unit group for performing processing for the substrate at a temperature close to room temperature.
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