Moving exposure system and method for maskless lithography system
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United States of America Patent
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Apr 30, 2002
Grant Date -
N/A
app pub date -
Jan 10, 2000
filing date -
Jan 10, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
A photolithography system and method for providing a mask image to a subject such as a wafer is provided. The mask images are divided into sub-patterns and sequentially provided to a pixel panel, such as a deformable mirror device or a liquid crystal display. The pixel panel converts each sub-pattern into a plurality of pixel elements. Each of the pixel elements is then simultaneously focused to discrete, non-contiguous portions of the subject through a microlense array. The subject and pixel elements are then moved (e.g., one or both may be moved) and the next sub-pattern in the sequence is provided to the pixel panel. As a result, light can be projected on the subject, according to the pixel elements, to create a contiguous image on the subject.
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