Developing method and developing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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May 7, 2002
Grant Date -
N/A
app pub date -
Jun 8, 2000
filing date -
Jun 9, 1999
priority date (Note) -
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status (Latency Note)
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Abstract
In a developing processing to apply the developing solution onto the substrate after the light exposure, a developing solution supply nozzle scans a substrate more than once while discharging the developing solution on the substrate in a band shape to coat the substrate with the developing solution. Thus, it is possible to perform a developing processing with a small variation and high uniformity of the line width.
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