Chemical vapor deposition precursors

United States of America Patent

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May 7, 2002
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Dec 1, 1999
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May 14, 1997

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Abstract

Zirconium precursors for use in depositing thin films of or containing zirconium oxide using an MOCVD technique have the following general formula: Zr.sub.x (OR).sub.y L, wherein R is an alkyl group; L is a .beta.-diketonate group; x=1 or 2; y=2, 4 or 6; and z=1 or 2.

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HANGER SOLUTIONS LLC	44 MILTON AVENUE SUITE 254 ALPHARETTA GA 30009

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Inventor Name	Address	# of filed Patents	Total Citations
Crosbie, Michael J	Malvern, GB	2	18
Jones, Anthony C	Prescot, GB	44	472
Lane, Penelope A	Malvern, GB	1	13
Leedham, Timothy J	Diss Norfolk, GB	3	40
Williams, Dennis J	Malvern, GB	5	107
Wright, Peter J	Malvern, GB	35	1058

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Chemical vapor deposition precursors

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United States of America Patent

09423750

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US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 07, 2002	US,6383669,B1 US6383669B1	GRANTED PATENT AS FIRST PUBLICATION
March 21, 2002	US,20020034586,A1 US20020034586A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	6383669
SERIAL NO	09423750
DOCKET NO

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09423750

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