Conditioning disk for conditioning a polishing pad
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
May 14, 2002
Grant Date -
N/A
app pub date -
Oct 27, 2000
filing date -
Oct 29, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention generally provides an apparatus and a method for conditioning a polishing pad in a polishing system. In one embodiment, the apparatus includes a conditioning disk having conditioning elements disposed on the bottom surface and away from the center portion of the disk. In another embodiment, the apparatus includes a base plate and a ring-shaped plate in which the conditioning elements are disposed on the ring-shaped plate. In still another embodiment, the apparatus includes a conditioning disk having conditioning elements disposed on the bottom surface and away from the center portion of the disk and having brush bristles disposed on the center portion of the disk.
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