Imaging method using phase boundary masking with modified illumination
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 14, 2002
Grant Date -
N/A
app pub date -
Nov 15, 2000
filing date -
Nov 15, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A projection lithography system provides a cross-quadrupole illumination pattern in combination with a translucent substrate having boundary relief features. The features are spaced close together so that they are not imaged in a focal plane, but generate a dark image of the space between the features in the focal plane.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully