Method for removing particles from surface of article
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United States of America Patent
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-
May 21, 2002
Issued Date -
N/A
app pub date -
May 1, 2001
filing date -
Nov 5, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and an apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.
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