Micromachining method for workpiece observation
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United States of America Patent
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May 28, 2002
Grant Date -
N/A
app pub date -
Nov 30, 1994
filing date -
Nov 30, 1993
priority date (Note) -
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status (Latency Note)
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Abstract
A method for preparing a sample for observation, by the steps of: contacting a first predetermined area of the sample surface with an organic compound vapor while irradiating the first predetermined area with an ion beam to decompose the organic compound into a layer having a mask function, the layer covering the first predetermined area; and contacting a second predetermined area of the sample surface with an etching gas while irradiating the second predetermined area with an ion beam in order to remove material from the sample surface at the second predetermined area, wherein the second predetermined area includes at least part of the first predetermined area and the layer covering the first predetermined area prevents removal of material from the sample surface in the first predetermined area.
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