Situ plasma clean gas injection
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Jun 4, 2002
Issued Date -
N/A
app pub date -
Aug 10, 2000
filing date -
Aug 11, 1998
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A processing chamber with a showerhead and a chuck is cleaned using an injection of a gaseous cleaning agent through an aperture in the chuck into the processing chamber. Because the aperture is located directly under the showerhead, a portion of the gaseous cleaning agent passes through the face plate of the showerhead so that the inside of the showerhead may be cleaned as well. By applying a radio frequency power supply between the chuck and the showerhead, for example, by a coil located between the chuck and showerhead or applying the power directly to the chuck and the showerhead, the gaseous cleaning agent forms a plasma. Thus, the portion of the gaseous cleaning agent that passes through the face plate and into the showerhead is a plasma. The plasma is pumped out of the chamber through a pumping port so that the plasma continuously flows through the processing chamber.
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