Scanning electronic microscope and method for automatically observing semiconductor wafer
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United States of America Patent
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Jun 4, 2002
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N/A
app pub date -
Jan 8, 1999
filing date -
Jan 9, 1998
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Abstract
A method for automatically recognizing a stage position of a feature of a semiconductor wafer comprises the steps of identifying a feature of a semiconductor wafer disposed at a predetermined distance from an alignment mark on the semiconductor wafer and obtaining an electron beam image, an optical image or a differential image thereof of the feature of the semiconductor wafer. A normalized correlation coefficient from the image of the feature is then calculated, and a stage position of the feature of the semiconductor wafer is automatically recognized in accordance with the normalized correlation coefficient.
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