Substrate processing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Jun 11, 2002
Grant Date -
N/A
app pub date -
Oct 2, 2000
filing date -
Oct 6, 1999
priority date (Note) -
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Abstract
A first processing unit group for performing solution processing and a second processing unit group including heat and cooling processing units each having a heat processing unit and a cooling processing unit are arranged adjacent to each other such that the cooling processing unit is located on the first processing unit group side. This makes it possible to conduct temperature control precisely in a solution processing unit for performing solution processing for a substrate at about room temperature.
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