Method for in-situ formation of bottle shaped trench by gas phase etching
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United States of America Patent
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-
Jun 11, 2002
Grant Date -
N/A
app pub date -
May 3, 1999
filing date -
May 3, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method fabricates a bottle shaped trench by providing a substrate with a substantially vertical trench therein and a collar about an upper interior portion of the trench and isotropically HCl etching a lower interior portion of the trench under the collar for expansion thereof, wherein the expanded lower interior portion has a wider cross section than that of the upper interior portion of the trench. Further, the method performs potential in-situ process integration with a gas phase doping in the same tool as the one that performed the gas phase etching process.
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