Procedure and device for calibrating the gas pressure in a process vacuum chamber (receiver)

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United States of America Patent

PATENT NO 6408254
SERIAL NO

09353450

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A system for treating goods, in particular for coating optical substrates, under a vacuum, within a gas-tight sealable, evacuatable vacuum chamber (receiver) that can be provided with an inert gas atmosphere, includes a device for calibrating the gas pressure in the receiver for a respective operating cycle. The calibrating device has a calibration pressure vessel (2) having a volume (v) lower than the volume (V) of the receiver (1) and is connected in terms of flow with an inert gas source and the receiver (1) via actuatable valve fittings (3, 4), wherein the receiver (1) and calibration pressure vessel (2) are each linked via a pressure gage (5 or 6) with a computer (7), which controls the valve fittings (3, 4) for introducing the gas into the calibration pressure vessel (2) or receiver (1) by way of a downstream controller (8). The measures of the calibration device make it possible to calibrate the gas pressures in a gas-tight sealable, evacuatable vacuum chamber (receiver) that can be provided with an inert gas atmosphere, in such a way as to repeatedly ensure a preset, constant gas concentration in the receiver within an operating or treatment cycle.

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Patent Owner(s)

  • SATISLOH AG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Suter, Rudolf Horw, CH 6 34

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