Method to resolve the passivation surface roughness during formation of the AlCu pad for the copper process

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United States of America Patent

PATENT NO 6413863
SERIAL NO

09489971

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Abstract

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In accordance with the objectives of the invention a new method is provided to create aluminum pads that overlay an electrical contact point. A layer of passivation is deposited over the surface that contains one or more electrical contact points, the layer of passivation is patterned thereby creating openings in the layer of passivation that overlay and align with one or more of the contact points. Under the first embodiment of the invention, a layer of AlCu is deposited over the patterned layer of passivation thereby including the openings that have been created in the layer of passivation. The deposited layer of AlCu is patterned and etched thereby creating the required AlCu bond pad. In addition to creating the required AlCu bond pad, the etch of the layer of AlCu also creates a pattern of dummy AlCu pads that are not in contact with any underlying points of electrical contact but that are located on the surface of the layer of passivation. The dummy AlCu pads counteract the above indicated effect of theta phase propagation that occurs during the AlCu etching resulting in a passivation layer that has a smooth surface and that therefore provides a good underlying layer for the created AlCu pads. Under the second embodiment of the invention, a layer of pure aluminum is sputter deposited over the passivation layer including the openings that has been created in the passivation layer. The deposited layer of aluminum is patterned and etched thereby creating the required aluminum pad.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANYNO 121 PARK AVE 3 SCIENCE BASED INDUSTRIAL PARK HSINCHU TAIWAN R O C

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Liu, Chung-Shi Hsin-Chu, TW 824 11367
Shue, Shau-Lin Hsin-Chu, TW 447 7036
Yu, Chen-Hua Hsin-Chu, TW 2207 47923

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