Erosion compensated magnetron with moving magnet assembly
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United States of America Patent
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-
Jul 9, 2002
Grant Date -
N/A
app pub date -
Jun 21, 2000
filing date -
Jun 21, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A magnetron including a target (2) for sputtering onto a substrate in described. The magnetron comprises a magnetic field generator (4) for generating a closed loop magnetic field adapted to generate a plasma race-track above the target (2) and a driving device for establishing relative substantially translational movement between the race-track and the target (2) and adapted to influence the magnetic field generated by the magnetic field generator (4) at least during part of the relative substantially translational movement, the distance between any point on the race track and the momentarily closest part of the one or more pieces (50) of ferromagnetic material varying in accordance with the relative substantially translational movement of the race-track and the target (2).
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