Method for forming carbonaceous hard film
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United States of America Patent
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Jul 9, 2002
Grant Date -
N/A
app pub date -
Nov 19, 1999
filing date -
Nov 19, 1999
priority date (Note) -
Expired
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Abstract
A method for enabling the formation of a carbonaceous hard film having a high hardness, strong adherence to the substrate, a wide range of substrate compatibility, and structural stability, which can be formed at room temperature and may cover a large area. The method includes vapor depositing a hard film of a carbonaceous material onto a substrate under vacuum by depositing a vaporized, hydrogen free carbonaceous material, which may be ionized or non-ionized, onto the substrate surface while irradiating the carbonaceous material with gas cluster ions, generated by ionizing gas clusters to form the film.
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