Method for making long focal length micro-lens for color filters
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United States of America Patent
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Jul 9, 2002
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N/A
app pub date -
Apr 12, 2000
filing date -
Apr 12, 2000
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Abstract
A method for making long focal length micro-lens for color filters in CMOS image sensor applications and device made by the method are described. In the method, a layer of micro-lens material is first spin coated on top of a color filter, patterned by a photolithographic method into at least four discrete regions, and preferably at least nine discrete regions for each micro-lens with a pre-set spacing therein between. The discrete regions allow a smaller volume of micro-lens material to be used for forming the micro-lens in a subsequent reflow process. The micro-lens formed by the present invention novel method has a focal length of at least 7 .mu.m, and preferably at least 10 .mu.m such that a 0.35 .mu.m technology CMOS image sensor utilizing two or three layers of metal conductors can be formed by the present invention method.
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