Cleaning agent composition, method for cleaning and use thereof
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United States of America Patent
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Jul 9, 2002
Grant Date -
Sep 27, 2001
app pub date -
Feb 28, 2001
filing date -
Feb 29, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An object of the present invention is to provide a new cleaning agent composition having excellent cleaning power for the surface contamination of a semiconductor wafer or various precisely worked instruments made of glass or ceramic, which is used in the manufacture of wafer; a method for cleaning a wafer; a semiconductor wafer having a surface cleaned by a cleaning method; and a method for manufacturing a semiconductor wafer. A semiconductor wafer is cleaned using a cleaning agent composition including a specific fluorine-containing anionic surfactant, a quaternary ammonium hydroxide and/or an alkanolamine.
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