Quasi-continuous wave lithography apparatus and method
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United States of America Patent
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Jul 16, 2002
Grant Date -
Jun 20, 2002
app pub date -
May 27, 1999
filing date -
May 27, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A lithography system for providing interconnections of integrated circuits on a substrate includes a laser system with a high reflector and an output coupler that define an oscillator cavity. A gain medium and a mode locking device are positioned in the oscillator cavity. A diode pump source produces a pump beam that is incident on the gain medium. A processor is coupled to the laser system and stores a representation of interconnections for the integrated circuit. An output beam directing apparatus is coupled to the processor and directs the output beam to the substrate and form the interconnections.
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