Methods of making an etch mask and etching a substrate using said etch mask
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United States of America Patent
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Jul 23, 2002
Issued Date -
N/A
app pub date -
Jun 8, 2000
filing date -
May 15, 1992
priority date (Note) -
Expired
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Abstract
A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
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