Molybdenum-sulphur coatings
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United States of America Patent
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Jul 23, 2002
Issued Date -
N/A
app pub date -
Oct 2, 1998
filing date -
Jul 19, 1995
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Abstract
An unbalanced magnetron sputter ion plating system has a first magnetron with a first target of metal sulphide (e.g. MoS.sub.2) and a second magnetron with a second target of metal (e.g. Titanium). In order to recover water and sulphur impurities from the surfaces of the coating chamber the metal target is energised in a pre-coating ion cleaning operation. The Titanium target remains energised during the deposition of the molybdenum-sulphur coating to produce a Mo.sub.x Ti.sub.y S.sub.z coating where x+y.apprxeq.1 and Z.apprxeq.2. Best results are achieved if the Titanium content is about 18% or less by weight of the total coating content.
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