Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereof
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United States of America Patent
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Jul 30, 2002
Grant Date -
N/A
app pub date -
May 22, 2000
filing date -
Nov 8, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention relates to an integrated apparatus for monitoring wafers and for process control in the semiconductor manufacturing process, by means of optical measurements at more than one spectral range that can be installed inside any part of the semiconductor production line, i.e., inside the photocluster equipment, the CVD equipment or the CMP equipment. The apparatus comprises a measuring unit (110) for performing optical measurements in predetermined sites on said wafer, illumination sources for illuminating said wafer via measuring unit (10,50), supporting means (30) for holding, rotating and translating the wafer and a control unit (120). The measuring unit (110) comprises: (a) at least two separate optical units, each operating at a different distinct spectral range; (b) a separate optical window for each optical unit (31, 32); (c) at least one movable optical head (34); (d) mechanical means for translating said optical head relatively to the wafer's surface.
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