Exhaust particulate controller and method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Aug 6, 2002
Grant Date -
N/A
app pub date -
Sep 8, 2000
filing date -
Sep 8, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An exhaust gas particulate controller is included between an exhaust of a barrel chemical vapor deposition reactor and the gas scrubber system. The exhaust gas particulate controller is positioned as close to the exhaust of the reactor as is practical. The exhaust gas particulate controller is a passive system that prevents generation of particulates associated with gas density changes that occur during processing within the reactor.
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