Composition and method for removing resist and etching residues using hydroxylazmmonium carboxylates

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6432209
APP PUB NO 20020013240A1
SERIAL NO

09034552

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A mixture of hydroxylamine partially neutralized with a weak carboxylic acid and an organic solvent such as an alkyl sulfoxide, a pyrrolidinone or a sulfone removes hardened photoresist and polymeric photoresist residues from a substrate with reduced metal corrosion.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
SILICON VALLEY CHEMLABS, INC.SUNNYVALE, CA0

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sahbari, Javad J Sunnyvale, CA 17 237

Cited Art Landscape

Patent Info (Count) # Cites Year
 
EKC TECHNOLOGY, INC. (8)
5279771 Stripping compositions comprising hydroxylamine and alkanolamine 82 1990
* 5399464 Triamine positive photoresist stripping composition and post-ion implantation baking 26 1992
5334332 Cleaning compositions for removing etching residue and method of using 147 1992
5381807 Method of stripping resists from substrates using hydroxylamine and alkanolamine 51 1993
5482566 Method for removing etching residue using a hydroxylamine-containing composition 57 1994
* 5672577 Cleaning compositions for removing etching residue with hydroxylamine, alkanolamine, and chelating agent 37 1995
* 5902780 Cleaning compositions for removing etching residue and method of using 19 1997
* 5911835 Method of removing etching residue 57 1997
 
TOKYO OHKA KOGYO CO., LTD. (3)
* 5795702 Photoresist stripping liquid compositions and a method of stripping photoresists using the same 76 1996
* 5792274 Remover solution composition for resist and method for removing resist using the same 60 1996
* 5968848 Process for treating a lithographic substrate and a rinse solution for the treatment 43 1997
 
AVANTOR PERFORMANCE MATERIALS, INC. (1)
5308745 Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins 110 1992
 
VERSUM MATERIALS US, LLC (1)
5419779 Stripping with aqueous composition containing hydroxylamine and an alkanolamine 70 1993
 
OLIN MICROELECTRONIC CHEMICALS, INC. (1)
* 5665688 Photoresist stripping composition 16 1996
 
FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (2)
* 5648324 Photoresist stripping composition 38 1996
* 5780406 Non-corrosive cleaning composition for removing plasma etching residues 38 1996
* Cited By Examiner

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
Other [Check patent profile for assignment information] (2)
* 2005/0106,492 Photoresist stripping solution and a method of stripping photoresists using the same 7 2004
* 2007/0003,859 Photoresist stripping solution and a method of stripping photoresists using the same 1 2006
 
SCP SERVICES, INC. (F/K/A AKRION SCP ACQUISITION CORP.) (1)
* 6878213 Process and system for rinsing of semiconductor substrates 4 1999
 
AVANTOR PERFORMANCE MATERIALS, LLC (1)
8168577 Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion 0 2009
 
KIRKER ENTERPRISES, INC. (4)
7976827 Nail enamel compositions having a decorative color effect 0 2006
* 2007/0231,281 Nail enamel compositions having a decorative color effect 4 2006
8765102 Nail enamel compositions having a decorative color effect 0 2009
* 2010/0086,505 NAIL ENAMEL COMPOSITIONS HAVING A DECORATIVE COLOR EFFECT 0 2009
 
ADVANCED TECHNOLOGY MATERIALS, INC. (1)
* 6773873 pH buffered compositions useful for cleaning residue from semiconductor substrates 39 2002
 
UNITED MICROELECTRONICS CORP. (1)
* 7413848 Method of removing photoresist and photoresist rework method 2 2005
 
TOKYO OHKA KOGYO CO., LTD. (1)
* 2003/0099,908 Photoresist stripping solution and a method of stripping photoresists using the same 4 2002
 
VERSUM MATERIALS US, LLC (2)
7879782 Aqueous cleaning composition and method for using same 7 2005
* 2007/0087,948 Aqueous cleaning composition and method for using same 2 2005
* Cited By Examiner