US Patent No: 6,432,209

Number of patents in Portfolio can not be more than 2000

Composition and method for removing resist and etching residues using hydroxylazmmonium carboxylates

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ALSO PUBLISHED AS: 20020013240
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Importance

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Abstract

A mixture of hydroxylamine partially neutralized with a weak carboxylic acid and an organic solvent such as an alkyl sulfoxide, a pyrrolidinone or a sulfone removes hardened photoresist and polymeric photoresist residues from a substrate with reduced metal corrosion.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
SILICON VALLEY CHEMLABS, INC.SUNNYVALE, CA7

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sahbari, Javad J San Jose, CA 17 148

Cited Art

Patent Info (Count) # Cites Year
 
EKC TECHNOLOGY, INC. (8)
5,279,771 Stripping compositions comprising hydroxylamine and alkanolamine 77 1990
5,399,464 Triamine positive photoresist stripping composition and post-ion implantation baking 26 1992
5,334,332 Cleaning compositions for removing etching residue and method of using 143 1992
5,381,807 Method of stripping resists from substrates using hydroxylamine and alkanolamine 50 1993
5,482,566 Method for removing etching residue using a hydroxylamine-containing composition 56 1994
5,672,577 Cleaning compositions for removing etching residue with hydroxylamine, alkanolamine, and chelating agent 34 1995
5,902,780 Cleaning compositions for removing etching residue and method of using 18 1997
5,911,835 Method of removing etching residue 49 1997
 
TOKYO OHKA KOGYO CO., LTD. (3)
5,795,702 Photoresist stripping liquid compositions and a method of stripping photoresists using the same 62 1996
5,792,274 Remover solution composition for resist and method for removing resist using the same 54 1996
5,968,848 Process for treating a lithographic substrate and a rinse solution for the treatment 39 1997
 
FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (2)
5,648,324 Photoresist stripping composition 26 1996
5,780,406 Non-corrosive cleaning composition for removing plasma etching residues 32 1996
 
AIR PRODUCTS AND CHEMICALS, INC. (1)
5,419,779 Stripping with aqueous composition containing hydroxylamine and an alkanolamine 65 1993
 
AVANTOR PERFORMANCE MATERIALS, INC. (1)
5,308,745 Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins 98 1992
 
OLIN MICROELECTRONIC CHEMICALS, INC. (1)
5,665,688 Photoresist stripping composition 15 1996

Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
ADVANCED TECHNOLOGY MATERIALS, INC. (1)
6,773,873 pH buffered compositions useful for cleaning residue from semiconductor substrates 22 2002
 
AIR PRODUCTS AND CHEMICALS, INC. (1)
7,879,782 Aqueous cleaning composition and method for using same 0 2005
 
AVANTOR PERFORMANCE MATERIALS, INC. (1)
8,168,577 Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion 0 2009
 
KIRKER ENTERPRISES, INC. (1)
7,976,827 Nail enamel compositions having a decorative color effect 0 2006
 
SCP SERVICES, INC. (F/K/A AKRION SCP ACQUISITION CORP.) (1)
6,878,213 Process and system for rinsing of semiconductor substrates 3 1999
 
UNITED MICROELECTRONICS CORP. (1)
7,413,848 Method of removing photoresist and photoresist rework method 1 2005

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