US Patent No: 6,432,209

Number of patents in Portfolio can not be more than 2000

Composition and method for removing resist and etching residues using hydroxylazmmonium carboxylates

ALSO PUBLISHED AS: 20020013240

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Abstract

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A mixture of hydroxylamine partially neutralized with a weak carboxylic acid and an organic solvent such as an alkyl sulfoxide, a pyrrolidinone or a sulfone removes hardened photoresist and polymeric photoresist residues from a substrate with reduced metal corrosion.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
SILICON VALLEY CHEMLABS, INC.SUNNYVALE, CA0

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sahbari, Javad J Sunnyvale, CA 17 191

Cited Art Landscape

Patent Info (Count) # Cites Year
 
EKC Technology, Inc. (8)
5,279,771 Stripping compositions comprising hydroxylamine and alkanolamine 79 1990
* 5,399,464 Triamine positive photoresist stripping composition and post-ion implantation baking 26 1992
5,334,332 Cleaning compositions for removing etching residue and method of using 145 1992
5,381,807 Method of stripping resists from substrates using hydroxylamine and alkanolamine 51 1993
5,482,566 Method for removing etching residue using a hydroxylamine-containing composition 57 1994
* 5,672,577 Cleaning compositions for removing etching residue with hydroxylamine, alkanolamine, and chelating agent 36 1995
* 5,902,780 Cleaning compositions for removing etching residue and method of using 19 1997
* 5,911,835 Method of removing etching residue 55 1997
 
AIR PRODUCTS AND CHEMICALS, INC. (1)
5,419,779 Stripping with aqueous composition containing hydroxylamine and an alkanolamine 68 1993
 
TOKYO OHKA KOGYO CO., LTD. (3)
* 5,795,702 Photoresist stripping liquid compositions and a method of stripping photoresists using the same 72 1996
* 5,792,274 Remover solution composition for resist and method for removing resist using the same 57 1996
* 5,968,848 Process for treating a lithographic substrate and a rinse solution for the treatment 43 1997
 
AVANTOR PERFORMANCE MATERIALS, INC (1)
5,308,745 Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins 106 1992
 
OLIN MICROELECTRONIC CHEMICALS, INC. (1)
* 5,665,688 Photoresist stripping composition 16 1996
 
FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (2)
* 5,648,324 Photoresist stripping composition 33 1996
* 5,780,406 Non-corrosive cleaning composition for removing plasma etching residues 36 1996
* Cited By Examiner

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
SCP SERVICES, INC. (F/K/A AKRION SCP ACQUISITION CORP.) (1)
* 6,878,213 Process and system for rinsing of semiconductor substrates 4 1999
 
KIRKER ENTERPRISES, INC. (2)
7,976,827 Nail enamel compositions having a decorative color effect 0 2006
8,765,102 Nail enamel compositions having a decorative color effect 0 2009
 
ADVANCED TECHNOLOGY MATERIALS, INC. (1)
* 6,773,873 pH buffered compositions useful for cleaning residue from semiconductor substrates 27 2002
 
UNITED MICROELECTRONICS CORP. (1)
* 7,413,848 Method of removing photoresist and photoresist rework method 2 2005
 
AIR PRODUCTS AND CHEMICALS, INC. (1)
7,879,782 Aqueous cleaning composition and method for using same 1 2005
 
AVANTOR PERFORMANCE MATERIALS, INC (1)
8,168,577 Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion 0 2009
* Cited By Examiner