Substrate washing method
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United States of America Patent
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-
Aug 13, 2002
Issued Date -
N/A
app pub date -
Nov 28, 2000
filing date -
Jan 6, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The substrate washing method of the present invention comprises the steps of holding the substrate substantially horizontally, supplying a cleaning liquid to a surface of the substrate through a film scrub member permeable to liquid and allowing the film scrub member in contact with the surface of the substrate, pressing the film scrub member onto the surface of the substrate in excess of a zero point, which is an initial contact point of the film scrub member with the surface of the substrate, thereby bringing the film scrub member into contact with the surface of the substrate in an overdriving manner and moving the film scrub member relative to the substrate to scrub the surface of the substrate by the film scrub member.
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