Magnetic finishing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Aug 20, 2002
Grant Date -
N/A
app pub date -
Oct 9, 2001
filing date -
Oct 10, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A finishing apparatus having magnetically responsive finishing elements that can be smaller than the workpiece being finished are disclosed. The finishing apparatus supplies a parallel finishing motion to finishing elements solely through magnetic coupling forces. The finishing apparatus can supply multiple different parallel finishing motions to multiple different finishing elements solely through magnetic coupling forces to improve finishing quality and versatility. The new magnetic finishing methods, apparatus, and magnetically responsive finishing elements can help improve yield and lower the cost of manufacture for finishing of workpieces having extremely close tolerances such as semiconductor wafers.
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