Polymeric polishing pad having continuously regenerated work surface
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United States of America Patent
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-
Aug 27, 2002
Issued Date -
N/A
app pub date -
Aug 4, 1999
filing date -
Aug 19, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An article or polishing pad for altering a surface of a workpiece includes a polymeric matrix having a work surface and a subsurface proximate to the work surface. When the article is in contact with a working environment, the work surface is made relatively softer than the subsurface as a result of exposure to the working environment. As the work surface wears during use, the subsurface immediately adjacent to the work surface becomes exposed to the working environment and becomes the relatively softer work surface. As a result, the relatively softer work surface is continuously regenerated. In an alternative embodiment, an article for altering a surface of a workpiece includes a work surface having a texture, and the texture includes artifacts arranged in a fractal pattern.
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