Semiconductor device and method for manufacturing the same
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United States of America Patent
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Sep 10, 2002
Grant Date -
Oct 25, 2001
app pub date -
Jun 21, 2001
filing date -
Mar 27, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
As an outside box mark for automatic overlay measurement formed on a semiconductor substrate, a # shape is formed by laying two vertical lines formed by word lines over two parallel lines formed of bit lines. Thereby, a misalignment value in the word line direction and a misalignment value in the bit line direction are measured simultaneously by using one box mark. When forming capacity contacts between wiring lines of a #-shaped structure formed of word lines and bit lines, it is conducted by using a box mark for automatic overlay measurement. As a result, it becomes possible to shorten the time required for measuring the misalignment values in the X direction (word lines) and Y direction (bit lines) and analyzing the measurement result.
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