Polycrystalline silicon-germanium films for micro-electromechanical systems application

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Sep 10, 2002
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Jul 17, 2000
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Jan 15, 1999

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Abstract

This invention relates to micro-electromechanical systems using silicon-germanium films. Such a system includes one or more layers of Si.sub.1-x Ge.sub.x, deposited on a substrate, where 0

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Patent Owner	Address
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA	1111 FRANKLIN STREET TWELFTH FLOOR OAKLAND CA 94607

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Franke, Andrea	Oakland, CA	3	343
Howe, Roger T	Martinez, CA	68	4561
King, Tsu-Jae	Fremont, CA	78	4150

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Polycrystalline silicon-germanium films for micro-electromechanical systems application

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09617300

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PATENT NO	6448622
SERIAL NO	09617300
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09617300

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