Method for the wet chemical pyramidal texture etching of silicon surfaces
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United States of America Patent
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Sep 17, 2002
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app pub date -
Mar 18, 1999
filing date -
Mar 18, 1998
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Abstract
A new and improved etching solution and etching method provide wet chemical pyramidal texture etching of (100) silicon surfaces. A uniform and completely pyramidal texture etching of silicon surfaces is achieved with an etching solution including water, an alkaline reagent, and isopropanol together with an aqueous alkaline ethylene glycol solution.
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