Method of forming copper interconnection utilizing aluminum capping film
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 17, 2002
Grant Date -
N/A
app pub date -
Oct 4, 1999
filing date -
Oct 4, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A mostly copper-containing interconnect (126) overlies a semiconductor device substrate (100), and a transitional metallurgy structure (312, 508, 716, 806) that includes an aluminum-containing film (200, 506, 702, 802) contacts a portion of the mostly copper-containing interconnect. In one embodiment, the transitional metallurgy is formed over a portion of a bond pad (128). In an alternative embodiment, the transitional metallurgy includes an energy alterable fuse portion (710) that electrically contacts two conductive regions (712 and 714), and in yet another embodiment, the transitional metallurgy is formed over a copper-containing edge seal portion (809).
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully