Semiconductor device substrate and a process for altering a semiconductor device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Sep 17, 2002
Grant Date -
N/A
app pub date -
Jun 22, 2000
filing date -
Jun 22, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
A semiconductor device substrate (600, 900) includes a semiconductor device (310, 314, 405, 424, 506, 912, 914, 918) and an alignment structure (508, 902) lying near the semiconductor device. The substrate (600, 900) includes a reflective layer (506, 510) and an antireflective layer (316, 926). The antireflective layer (316, 926) has a positional relationship with respect to the reflective layer (506, 510). The positional relationship is either such that the antireflective layer (316, 926) overlies all the reflective layer (506, 510) or such that none of the antireflective layer (316, 926) overlies the reflective layer (506, 510). The alignment structure (508, 902) includes an alignment feature (512), such as an alignment key. The alignment structure (508, 902) allows for detection of contrasting light reflecting differentials as a continuous wave laser is targeted at the reflective layer (506, 510) and moved to the alignment feature (512), in order to improve precision of alignment in manufacturing operations.
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