Method and materials for purifying hydride gases, inert gases, and non-reactive gases
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 8, 2002
Grant Date -
Aug 1, 2002
app pub date -
Sep 17, 2001
filing date -
Dec 4, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention provides an efficient process by which trace impurities are removed from matrix hydride, inert gases and non-reactive gases, thus decreasing the concentration of the trace gases by a factor of 100-to-10,000, and more specifically to part-per-billion (ppb) or part-per-trillion (ppt) levels. Hydride gases such as ammonia, phosphine and arsine, and inert gases such as nitrogen, helium, hydrogen, and argon are purified by removing trace contaminants such as silane (SiH.sub.4), hydrogen sulfide (H.sub.2 S) and germane (GeH.sub.4), along with traces of moisture. The gas purifier materials of this invention include thermally activated aluminas from organic sources, thermally activated modified organic alumina materials, and thermally activated modified aluminas from an inorganic source. The thermally activated alumina materials of this invention are activated by heating the alumina material at a temperature between about 200-1000.degree. C. in an inert atmosphere and maintaining the activated material in an inert atmosphere.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully