Illumination device for projection system and method for fabricating
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United States of America Patent
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Oct 15, 2002
Grant Date -
N/A
app pub date -
Oct 21, 1999
filing date -
Oct 22, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An illumination system for a microlithographic stepper has a light source that emits light of selected wavelength(s) along an optical path toward a photomask. An aperture mask is positioned in the path of the illumination light and between the light source and the photomask. The aperture mask has a dithered pattern of pixels. The intensity of the pattern controls the illumination of the photomask. The masking aperture pattern defines one or more zones of illumination. Each zone has elements that are patterned in accordance with a selected wavelength of incident light to diffract the incident light into an illumination pattern for illuminating a photomask. Each of the elements is constructed with a matrix of pixels. In the preferred embodiment the array of pixels is 8.times.8. The number of elements is generally greater than 3.times.3.
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