Reticle design inspection system
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United States of America Patent
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Oct 15, 2002
Grant Date -
N/A
app pub date -
Sep 17, 1998
filing date -
Sep 17, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method of reticle inspection, comprising generating a test reticle comprising a plurality of test pattern-features thereon; manufacturing a wafer using the reticle; and determining a transfer of at least one of said plurality of pattern features from said reticle to said wafer. Preferably, a neural network is trained using the determination. Preferably, a reticle is inspected by running detected defects through the neural network to determine if the detected defect has a consequence.
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