Method and system for reticle inspection by photolithography simulation
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United States of America Patent
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Oct 15, 2002
Grant Date -
N/A
app pub date -
Sep 3, 1999
filing date -
Sep 3, 1999
priority date (Note) -
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status (Latency Note)
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Abstract
A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper.
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