Conductive interconnect structures and methods for forming conductive interconnect structures

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United States of America Patent

PATENT NO 6469394
SERIAL NO

09494756

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Abstract

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Interconnect structures and methods for making interconnect structures are disclosed. A typical interconnect structure has a tapered first end portion having a first substantially planar surface and a concave surface adjacent to the first planar surface. A second end portion of the interconnect structure includes a second substantially planar surface. The second planar surface has a larger area than the first planar surface. An intermediate portion is disposed between the first end portion and the second end portion.

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Patent Owner(s)

Patent OwnerAddress
FUJITSU LIMITED1-1 KAMIKODANAKA 4-CHOME NAKAHARA- KU KAWASAKI-SHI KANAGAWA 211-8588 211-8588

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Michael G San Jose, CA 77 2816
Wong, Connie M Fremont, CA 4 322

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