Gas purification method
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United States of America Patent
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Oct 29, 2002
Grant Date -
N/A
app pub date -
May 8, 2000
filing date -
May 11, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention relates to a gas purification method for adsorbing and removing impurities by PSA method combined with heating, capable of removing water vapor and carbon dioxide in an economical and effective way. The present invention includes an adsorption step of adsorbing and removing water vapor first and then carbon dioxide by introducing the compressed feed gas into the adsorption column; a depressurization step of lowering the internal pressure of the adsorption column down to atmospheric pressure after the adsorption step; a heating step of heating and regenerating an adsorbent by introducing a purge gas not containing the impurities into the adsorption column after the depressurization step; and a repressurization step of elevating pressure by introducing a gas not containing the impurities into the adsorption column after the heating step; wherein the period of time of the adsorption step, the depressurization step plus the heating step and the repressurization step are set to be within the range of 10 to 40 min respectively.
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